Researchers at the University of Tennessee (UT) and Oak Ridge National Laboratory (ORNL) developed a new protocol of creating silicon stamps for highly efficient nanotransfer printing (nTP). Current approach mainly relies on in situ formation of a fluoropolymer release layer immediately following anisotropic plasma etching of silicon. The potential of a current nTP approach has been demonstrated by imprinting various functional test structures of low nanometer scale (J. Am. Chem. Soc., DOI: 10.1021/ja201497a).
Deepak Bhandari, graduate student at UT, described the findings as "a technological improvement of nTP feature resolution down to sub-100 nm".
A native of Nepal, Deepak obtained both his bachelor and master degree in chemistry from Tribhuvan University, Nepal. After joining UT in Fall 2006, Deepak focused his research on "surface-enhanced Raman Scattering substrates development using both conventional and nanolithographic approaches". Graduating this May 12th, Deepak joined ORNL as a postdoctoral research associate and plans to pursue career in academia after short postdoctoral experience.